Optical projection system

ABSTRACT

An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of, and claims priority under 35 USC120 to, U.S. application Ser. No. 11/664,896, filed Nov. 28, 2008, nowU.S. Pat. No. 8,300,210, which is the National Stage of InternationalApplication No. PCT/EP05/10819, filed Oct. 1, 2005, which claims thebenefit of U.S. Provisional Application Ser. No. 60/617,415 filed Oct.8, 2004 and 60/700,220 filed Jul. 18, 2005. The contents of theseapplications are hereby incorporated by reference in its entirety.

This patent disclosure hereby incorporates by reference internationalPatent Application Serial No. PCT/EP2003/008962 published as WO2004/034149 on 22 Apr. 2004 and invented by Weber et al.

BACKGROUND OF THE INVENTION

The present invention relates to support units for optical sub-systems,in particular ions units, of microlithography systems. Furthermore, itrelates to an optical projection system comprising such a support unitand an optical exposure apparatus comprising such an optical projectionsystem. The invention may be used in the context of photolithographyprocesses for fabricating microelectronic devices, in particularsemiconductor devices, or in the context of fabricating devices, such asmasks or reticles, used during such photolithography processes.

Typically, the optical systems used in the context of fabricatingmicroelectronic devices such as semiconductor devices comprise aplurality of optical elements, such as lenses and mirrors etc., in thelight path of the optical system. Those optical elements usuallycooperate in an exposure process to transfer an image formed on areticle or the like onto a substrate such as a wafer. Said opticalelements are usually combined in several functionally distinct opticalsub-systems. These distinct optical sub-systems may be formed bydistinct lens units comprising a plurality of such optical elements,such as lenses and mirrors and other optical elements, of the opticalsystem. Refractive lens units or at least mainly refractive lens unitsmostly have a straight axis of symmetry of the optical elements usuallyreferred to as the optical axis. Moreover, they generally have anelongated substantially tubular design due to which they are typicallyreferred to as lens barrels.

Due to the ongoing miniaturization of semiconductor devices there is apermanent need for enhanced resolution of the optical systems used forfabricating those semiconductor devices. This need for enhancedresolution obviously pushes the need for an increased numerical apertureand increased imaging accuracy of the optical system. Furthermore, toreliably obtain high-quality semiconductor devices it is not onlynecessary to provide an optical system showing a high degree of imagingaccuracy. It is also necessary to maintain such a high degree ofaccuracy throughout the entire exposure process and over the lifetime ofthe system. As a consequence, the above optical sub-systems must besupported in a defined manner in order to maintain a predeterminedspatial relationship between said optical sub-systems to provide a highquality exposure process.

In many cases, several distinct lens barrels are directly connected toeach other to form a mechanical lens barrel unit as it is known, forexample, from EP 1 168 028 A2 to Takahashi et al. In these cases,support to the lens barrel unit is provided via a support structurecontacting a flange of one of the lens barrels. Often, different lensbarrels are supported separately by one or more support structures. Ineither case the support structures supporting the lens barrels or lensbarrel units typically are designed in the manner of an open skeletonframework. Such framework support structures are known, for example,from U.S. Pat. Nos. 5,638,223 and 6,529,264 B1 both to Ikeda as well asfrom U.S. Pat. Nos. 6,639,740 B1, 6,631,038 B1, 6,549,347 B1, 6,449,106B1, 6,473,245 B1 all to Spinali.

Those open support structures may allow for an accurate positioning ofthe lens barrels with respect to each other. However, they show thedisadvantage that, depending on the required spatial relationshipbetween the lens barrels, the light path may have to pass open areasoutside the lens barrels. For these areas a gas tight and light tightenclosure has to be provided for avoiding adverse effects on the qualityof the exposure process. Such an additional enclosure adds to theoverall complexity of the system

A further disadvantage of the above support structures lies within thefact that local deformations or position variations within singlecomponents of the support structure are likely to lead to positionvariations of the optical elements which largely affect the accuracy ofthe optical system and, thus, the quality of the exposure process.Furthermore, such variations cause extensive effort for re-adjusting theoptical system.

Furthermore, from WO 03/012548 A1 to Kohl et al., it is known to supportdistinct optical sub-systems of a microlithography system via a supportstructure in the form of a housing-like frame structure composed of anupper frame structure element and a lower frame structure element. Whilethe lower frame structure element supports a rather heavy elongatedrefractive optical sub-system in the form of an elongated lens barrel,the upper frame structure element only supports rather lightweightoptical sub-systems in the form of axially short lens or lens and mirrorgroups.

This design may be useful for a microlithography system with onlylightweight optical sub-systems located in the light path before anyheavy elongated refractive optical sub-system. However, further heavyelongated refractive optical sub-systems located in the light pathbefore said heavy elongated refractive optical sub-system mounted to thelower frame structure element seem to be mounted to open supportstructures as previously described. This again leads to the abovedisadvantages.

Furthermore, as it is known e.g. from U.S. Pat. No. 6,873,476 B2 toShafer, configurations of optical elements may be used inmicrolithography systems where certain optical elements have to bearranged off-axis. U.S. Pat. No. 6,873,476 B2 to Shafer discloses acatadioptric microlithography projection unit with a folded opticalaxis. One of the mirrors used has to be laterally offset from theremaining optical elements resulting in a housing structure thatdeviates from the cylindrical design of the remaining part of theprojection unit. This leads to a very complex design of the projectionunit that has considerable disadvantages with respect to its thermal anddynamic properties. Furthermore, peripheral units, such as coolingdevices etc., have also to be adapted to this complex design. Finally,assembly and adjustment of the projection unit are rather complicatedsince simple test methods available for rotationally symmetric units maynot be used.

SUMMARY OF THE INVENTION

It is thus an object of the present invention to provide for a supportof the optical sub-systems, in particular, the lens units, of an opticalprojection system of a microlithography system that, at least to someextent, overcomes the above disadvantages.

It is a further object of the present invention to provide for a supportof the optical sub-systems, in particular, the lens units, of an opticalprojection system of a microlithography system which is simple toimplement, which is of simple design and which allows for a simple anddurable adjustment of the position of said optical sub-systems withrespect to each other and with respect to an external reference.

It is a further object of the present invention to provide for anoptical projection system of a microlithography system, as well as toprovide for a support unit for optical sub-systems of a microlithographysystem, in particular, the lens units of a microlithography system, aswell as to provide for an optical exposure apparatus each of which, atleast to some extent, over-comes the above disadvantages.

It is a further object of the present invention to provide for anoptical projection system of a microlithography system, as well as toprovide for a support unit for optical sub-systems of a microlithographysystem, in particular, the lens units of a microlithography system, aswell as to provide for an optical exposure apparatus each of which issimple to implement, is of simple design and allows for a simple anddurable adjustment of the position of said optical sub-systems withrespect to each other and with respect to an external reference.

According to the invention it has been found that it is possible tointegrate several functions within a single compact optical elementmodule providing good thermal and dynamic properties. On the one hand,the housing of such an optical element module may serve as a loadbearing structure supporting several elongated and heavy opticalsub-systems or even all optical sub-systems of an optical projectionunit. On the other hand, the housing of such an optical element modulemay be designed in such a manner that it does not break up the externalsymmetry of the optical projection unit.

Thus, according to one aspect of the invention there is provided anoptical projection unit comprising a first optical element module and atleast one second optical element module. The first optical elementmodule comprises a first housing unit and at least a first opticalelement, the first optical element being received within the firsthousing unit and having an optically used first region defining a firstoptical axis. The at least one second optical element module is locatedadjacent to the first optical element module and comprises at least onesecond optical element, the second optical element defining a secondoptical axis of the optical projection unit. The first housing unit hasa central first housing axis and an outer wall extending in acircumferential direction about the first housing axis. The firstoptical axis is at least one of laterally offset and inclined withrespect to the first housing axis. Furthermore, the first housing axisis substantially collinear with the second optical axis.

According to a further aspect of the invention there is provided anoptical exposure apparatus for transferring an image of a pattern formedon a mask onto a substrate comprising a light path, a mask locationlocated within the light path and receiving the mask, a substratelocation located at an end of the light path and receiving thesubstrate, and an optical projection unit according to the inventionlocated within the light path between the mask location and thesubstrate location.

According to a further aspect of the invention there is provided amethod of holding a plurality of optical elements comprising, in a firststep, providing the plurality of optical elements and, in a second step,holding the plurality of optical elements relative to each other. Theplurality of optical elements comprises a first optical element and atleast one second optical element, the first optical element having anoptically used first region defining a first optical axis, and the atleast one second optical element defining a second optical axis. In thefirst step, a first housing unit is provided, the first housing unithaving a central first housing axis and an outer wall extending in acircumferential direction about the first housing axis. In the secondstep, the first optical element is held within the first housing unitsuch that the first optical axis is at least one of laterally offset andinclined with respect to the first housing axis. In the second step, theat least one second optical element is held with respect to the firsthousing unit such that the second optical axis is substantiallycollinear with the first housing axis.

With such an optical projection unit, such an optical exposure apparatusand such a method, respectively, it is possible to maintain the externalsymmetry of an optical projection unit the optical projection unit formspart of. In particular, this is possible despite the asymmetricarrangement of some of the optical elements received within the opticalprojection unit. Such a design with external symmetry is of a lesscomplexity which, in turn, leads to improved thermal and dynamicproperties compared to the known externally asymmetric designs.Furthermore, the complexity of peripheral units, such as cooling devicesetc., is also reduced leading to a reduced manufacturing effort.Finally, simple test methods available for rotationally symmetric unitsmay be used with such a design. Thus, assembly and adjustment of theprojection unit are less complicated compared to the known externallyasymmetric designs.

It will be appreciated that, although the external symmetry of thedesign according to the invention in some cases requires more buildingspace and larger housing components than known asymmetric designs, ithas been found that the advantages outlined above largely outweigh thesedisadvantages.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising alight path, a first lens unit receiving a first part of said light path,a second lens unit receiving a second part of said light path, a supportunit supporting said first lens unit and said second lens unit, saidsupport unit comprising a housing receiving a third part of said lightpath, said housing comprising at least a first interface and a secondinterface, said first interface being a first support interfacesupporting said first lens unit, said second interface being a secondsupport interface supporting said second lens unit, said first lens unitand said second lens unit being elongated lens units comprising aplurality of lenses.

It has been found that, with such a support unit, it is possible tointegrate several functions within a single unit. On the one hand, thehousing of said support unit may serve as a load bearing structuresupporting several elongated and heavy optical sub-systems or even alloptical sub-systems of the optical projection system. Due to itsstructural coherence, the housing provides a stable single reference forall lens units mounted to it. This considerably reduces the effort formutual adjustment of the lens units, which, in general, is to bemonitored and provided continuously. Furthermore, the housing of saidsupport unit may also integrate the light tight and gas tight enclosureof the light path between separate lens units. This considerably adds tothe simplicity of the overall design.

According to a further aspect of the present invention there is provideda support unit for supporting lens units of a microlithography systemcomprising a housing for partly receiving a light path, said housingcomprising at least a first interface and a second interface, said firstinterface being a first support interface for supporting an elongatedfirst lens unit comprising a plurality of lenses, said second interfacebeing a second support interface for supporting an elongated second lensunit comprising a plurality of lenses, said housing being adapted tosubstantially bear the load of said elongated first lens unit and saidelongated second lens unit.

It will be appreciated that the present invention may not only be usedin the context of lens units. It may also be used in the context ofsupporting optical sub-systems of any design, which may, exclusively orin part, contain optical elements other than refractive opticalelements, such as reflective optical elements and/or diffractive opticalelements etc.

Thus, according to a further aspect of the present invention there isprovided an optical projection system for a microlithography systemcomprising a light path, a first optical sub-system receiving a firstpart of said light path, a second optical sub-system receiving a secondpart of said light path, a support unit supporting said first opticalsub-system and said second optical sub-system, said support unitcomprising a housing receiving a third part of said light path, saidhousing comprising at least a first interface and a second interface,said first interface being a first support interface supporting saidfirst optical sub-system, said second interface being a second supportinterface supporting said second optical sub-system, said first opticalsub-system and said second optical sub-system being elongated unitscomprising a plurality of optical elements.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising alight path, a first lens unit receiving a first part of said light path,a second lens unit receiving a second part of said light path, a supportunit supporting said first lens unit and said second lens unit; saidfirst lens unit and said second lens unit being elongated lens unitscomprising a plurality of lenses; said support unit comprising a housingreceiving a third part of said light path and enclosing at least onereflective element; said housing comprising at least a first interfaceincluding a first passage for said light path and a second interfaceincluding a second passage for said light path; said housing forming anenvelope for said light path, said envelope, apart from said firstpassage and said second passage, being essentially light tight; saidfirst interface being a first support interface supporting said firstlens unit, and said second interface being a second support interfacesupporting said second lens unit.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising alight path, a first lens unit receiving a first part of said light path,a second lens unit receiving a second part of said light path, a supportunit supporting said first lens unit and said second lens unit; saidfirst lens unit and said second lens unit being elongated lens unitscomprising a plurality of lenses; said support unit comprising a housingreceiving a third part of said light path and enclosing at least onereflective element; said housing comprising at least a first interfaceand a second interface; said first interface being a first supportinterface supporting said first lens unit; said second interface being asecond support interface supporting said second lens unit at a locationsubstantially opposite to said first interface.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising alight path, at least two lens unit pairs, a support unit supporting eachlens unit pair; each of said lens unit pairs comprising two lens units,each of said lens units receiving a part of said light path; said lensunits being elongated lens units comprising a plurality of lenses; saidsupport unit comprising a housing receiving a further part of said lightpath; said housing comprising at least two interface pairs, eachinterface pair supporting one of said lens unit pairs; each of saidinterface pairs comprising two support interfaces arranged substantiallyopposite to one another, each of said support interfaces supporting oneof said lens units of said respective lens unit pair.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising alight path, a first lens unit receiving a first part of said light path,a second lens unit receiving a second part of said light path, a supportunit supporting said first lens unit and said second lens unit; saidfirst lens unit and said second lens unit being elongated lens unitscomprising a plurality of lenses; said support unit comprising asupporting part supporting said first lens unit and said second lensunit and a separate enveloping part enveloping a third part of saidlight path.

According to a further aspect of the present invention there is providedan optical projection system for a microlithography system comprising anoptical axis, at least a first optical element unit defining a firstpart of said optical axis, and a support unit supporting said firstoptical element unit; said support unit comprising a support housingreceiving at least one optical element, said at least one opticalelement defining at least a second part of said optical axis, saidsupport housing having at least a first interface, said first interfacebeing adapted to support and adjust said first optical element unit.

According to a further aspect of the present invention there is providedan optical exposure apparatus for transferring an image of a patternformed on a mask onto a substrate, comprising an optical projectionsystem according to the present invention.

Further embodiments of the present invention will become apparent fromthe dependent claims and the following description of preferredembodiments which refers to the appended figures. All combinations ofthe features disclosed, whether explicitly recited in the claims or not,are within the scope of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic partially sectional view of a preferred embodimentof an optical exposure apparatus according to the present inventioncomprising an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 2 is a schematic view of a further preferred embodiment of anoptical exposure apparatus according to the present invention comprisingan optical projection system according to the present invention with asupport unit according to the present invention;

FIG. 3 is a schematic view of a further preferred embodiment of anoptical exposure apparatus according to the present invention comprisingan optical projection system according to the present invention with asupport unit according to the present invention;

FIG. 4 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 5 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system according to thepresent invention with a support unit according to the presentinvention;

FIG. 6 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 7 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 8 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 9 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 10 is a schematic partially sectional view of a further preferredembodiment of an optical projection system according to the presentinvention with a support unit according to the present invention;

FIG. 11 is a schematic partially sectional view of a further preferredembodiment of an optical exposure apparatus according to the presentinvention comprising an optical projection system according to thepresent invention with a support unit according to the presentinvention;

FIG. 12 is a schematic partially sectional view of a further preferredembodiment of an optical exposure apparatus according to the presentinvention comprising an optical projection system according to thepresent invention with a support unit according to the presentinvention.

DETAILED DESCRIPTION OF THE INVENTION

First Embodiment

In the following, a first preferred embodiment of an optical exposureapparatus 1 according to the present invention comprising a catadioptricoptical projection system 2 according to the present invention with asupport unit 3 according to the present invention will be described withreference to FIG. 1.

The optical exposure apparatus 1 is adapted to transfer an image of apattern formed on a mask 4 onto a substrate 8. To this end, the opticalexposure apparatus 5 comprises an illumination system 6 illuminatingsaid mask and the optical projection system 2. The optical projectionsystem 2 projects the image of the pattern formed on the mask 4 onto thesubstrate 5, e.g. a wafer or the like.

The optical projection unit 2 comprises two optical sub-systems in theform of two elongated optical element units, namely a first opticalelement unit 7 and a second optical element unit 8 mounted to andsupported by the support unit 3. The support unit 3 also forms a firstoptical element module holding two first optical elements each having afirst optical axis as will be described further below.

It will be appreciated that, in the sense of the invention, the termelongated optical element unit is to designate a optical element unitwith an optical axis having a dimension along its optical axis which islarger than the dimension of its largest optical element transverse toits optical axis. Such a optical element unit may have a generallycylindrical design with an essentially circular cross section. However,any other type of cross section, such as a polygonal or elliptic crosssection may be chosen as well.

The optical projection unit 2 receives the part of the light pathbetween the mask 4 and the substrate 5. In particular, the first opticalelement unit 7 receives a first part of said light path while the secondoptical element unit 8 receives a second part of said light path. Thesupport unit 3 receives a third part of said light path located betweenthe first optical element unit 7 and the second optical element unit 8.

Each optical element unit 7, 8 comprises a stack of second opticalelement modules 7.1 and 8.1, respectively, connected to each other. Eachof said second optical element modules 7.1 and 8.1, respectively,comprises one or more second optical elements 7.2 and 8.2, respectively,as well as a support frame supporting said optical element 7.2 and 8.2,respectively.

The second optical elements 7.2 of the first optical element unit definea second optical axis 7.3 as a part of the straight optical axis of theoptical projection system 2, while the second optical elements 8.2 ofthe second optical element unit 8 define a third optical axis 8.3 as afurther part of the straight optical axis of the optical projectionsystem 2.

At least some of the second optical elements 7.2 and 8.2, respectively,are actively positioned during operation of the exposure apparatus 6 bymeans of active positioning devices controlled by a correspondingcontrol device (not shown). To this end, the control device may receiveinformation representative of the actual imaging quality provided by theoptical projection system 2 and control the operation of the activepositioning devices of the respective second optical element module 7.1and 8.1, respectively, in response to this information.

The support unit 3 forming the first optical element module comprises afirst housing unit 3.1 centrally arranged within the optical projectionunit 2. The first housing unit 3.1 has a centrally located first housingaxis 3.2 that is collinear with the second optical axes 7.3 and 8.3. Thefirst housing unit 3.1 furthermore has an outer wall 3.3 extending in acircumferential direction about the first housing axis 3.2.

The outer wall 3.3 is substantially rotationally symmetric with respectto the first housing axis 3.2. The outer wall 3.3 has an essentiallycircular cross section in a plane perpendicular to the first housingaxis 3.2. However, it will be appreciated that, with other embodimentsof the invention, any other geometry may be chosen that is substantiallysymmetric with respect to the first housing axis 3.2. It will beappreciated that, in the sense of the invention, the term substantiallysymmetric with respect to the first housing axis 3.2 is to be understoodas including any outer housing geometry that may be transformedsubstantially into itself by a rotation of less than 360° about thefirst housing axis.

This first housing unit 3.1 is of sufficient rigidity and strength totake the loads of the first optical element unit 7 and the secondoptical element unit 8. Furthermore, the housing 3.1 is opticallyfunctional. To this end, it forms a gas tight and light tight envelopeof the part of the light path between the first optical element unit 7and the second optical element unit 8. To provide this gas and lighttightness, the first optical element unit 7 and the second opticalelement unit 8, both, are mounted to the housing in as gas and lighttight manner via coupling elements 9 as disclosed in the German patentapplication No. 103 52 820.2, filed on Nov. 11, 2003, the disclosure ofwhich is incorporated herein by reference. These coupling elements 9also provide for a thermal deformation decoupling of the housing and therespective optical element unit 7, 8. Thus, in other words, the housingunit 3.1 integrates the function of supporting the first optical elementunit 7 and the second optical element unit 8 and the function ofenveloping said third part of the light path between the latter in a gastight and light tight manner.

A further optical sub-system 10 forming a reflective part of thecatadioptric optical projection system 2 is located within the firsthousing unit 3.1. This further optical sub-system is formed by tworeflective optical elements in the form of mirrors 10.1 and 10.2. Thesemirrors 10.1 and 10.2 define the shape of the light path within thefirst housing unit 3.1. Both mirrors 10.1 and 10.2 are mounted radiallyoffset, i.e. laterally offset, with respect to the first housing axis3.2. Both mirrors 10.1 and 10.2 are mounted are to the first housingunit 3.1 in a statically determinate way, namely in an isostatic manner.

To this end, the mirror 10.1 is mounted to a rotationally symmetriccircular ring shaped mirror holder 10.3 having a central holder axisthat is substantially collinear with the first housing axis 3.2.Similarly, the mirror 10.2 is mounted to a rotationally symmetriccircular ring shaped mirror holder 10.4 having a central holder axisthat is substantially collinear with the first housing axis 3.2. Foreach mirror 10.1 and 10.2 there are provided three suitable mirrorsupports 10.5 and 10.6, respectively, that are connected to therespective mirror holder 10.3 and 10.4. The mirror supports 10.5 and10.6 support the respective mirror 10.1 and 10.2 in the region of theoptically used first region 10.7 and 10.8, respectively, of therespective mirror 10.1 and 10.2. The mirror holders 10.3 and 10.4 are,in turn, mounted in a statically determinate way to the housing viathree evenly distributed suitable housing supports 10.9 and 10.10,respectively. The housing supports 10.9 and 10.10, respectively, aremounted to internal interfaces of the first housing unit 3.1 that areadapted for supporting and adjusting the respective mirror 10.1 and10.2.

It will be appreciated that, with other embodiments of the presentinvention, the mirrors may be mounted directly to the first housing unitin a statically determinate way. Furthermore, it will be appreciatedthat, with other embodiments of the present invention, one or both ofthe mirrors may be mounted to the housing or a mirror holder in astatically indeterminate way. For example, a statically overdeterminatemounting may be used to introduce defined deformations into therespective mirror.

The symmetric mirror holders 10.3 and 10.4 provide for a largelysimplified assembly of the respective mirror 10.1 and 10.2 within thefirst housing unit 3.1. This is, among others, due to the fact that themirror holders 10.3 and 10.4 may provide a constant distance to theinner circumference of the outer wall 3.3 allowing the use of identicalholder supports evenly distributed at the inner circumference of theouter wall 3.3.

However, it will be appreciated that, with other embodiments of theinvention, the respective mirrors 10.1 and 10.2, in theircircumferential direction, may extend beyond their optically used firstregion as it is indicated in FIG. 1 by the dashed contours 10.11 and10.12, respectively. This allows for an easier and more even support tothe mirrors, e.g. the use of support units evenly distributed at thecircumference of the respective mirror. Furthermore, such a design mayalso be beneficial in terms of the dynamic and thermal behavior of themirrors and their support. Of course, in such cases, the respectivemirror may be provided with a recess forming a passageway for the lightused during the projection process. Furthermore, in some cases, themirrors may even be of substantially symmetric shape although only thefirst region is optically used while a second region is optically unusedduring the projection process. It has been found that, although such adesign causes larger mirrors with large unused areas, in particular theadvantages in terms of dynamic and thermal behavior outlined abovelargely outweigh these disadvantages.

The further optical sub-system 10 forming a reflective part of thecatadioptric optical projection system 2 only comprises reflectiveoptical elements. However, it will be appreciated that, with otherembodiments of the present invention, the further optical sub-systemlocated within the housing may also comprise other optical elements,e.g. refractive optical elements such as lenses etc. or diffractiveoptical elements etc.

The optically used first region 10.7 of the mirror 10.1 defines a firstoptical axis 10.13 that is inclined with respect to the first housingaxis 3.2. The same applies to the mirror 10.2, where the optically usedfirst region 10.8 defines a first optical axis 10.14 that is inclinedwith respect to the first housing axis 3.2. Due to this inclination, therespective mirror 10.1 and 10.2 is laterally offset with respect to thefirst housing axis 3.2 and, thus, laterally offset with respect to thesecond optical axes 7.3 and 8.3. In other words, the respective mirror10.1 and 10.2 is arranged in an off-axis position with respect to thesecond optical axes 7.3 and 8.3.

The housing 3.1, at its upper side, provides a first interface 3.4 witha simple planar first interface surface 3.5. This first interface 3.4forms a first support interface for the first optical element unit 7that has a mating second interface. The first interface 3.4 is adaptedfor adjusting the first optical element unit 7 with respect to thehousing 3.1. The first interface 3.4 also forms a first passage for thelight path from the first optical element unit 7 to the support unit 3.

At its lower side, opposite to the upper side with the first interface3.4, the housing 3.1 provides a third interface 3.6 with a simple planarthird interface surface 3.7. This third interface 3.6 forms a thirdsupport interface for the second optical element unit 8 that has amating fourth interface. The third interface 3.7 is adapted foradjusting the second optical element unit 8 with respect to the housing3.1. The third interface 3.6 also forms a second passage for the lightpath from the support unit 3 to the second optical element unit 8.

These planar interface surfaces 3.5 and 3.7 are easy to manufacture e.g.by corresponding manufacturing processes such as turning, milling,grinding, polishing etc. or combinations thereof. They add to theoverall simplicity of the design.

The first interface surface 3.5 is parallel to the third interfacesurface 3.7. Furthermore, the second optical axis 7.3 of the firstoptical element unit 7 and the third optical axis 8.3 of the secondoptical element unit 8 are adjusted to assume a predetermined positionalrelationship. This predetermined positional relationship may be anynecessary positional relationship, e.g. parallel or inclined withrespect to each other. In the embodiment shown, the first optical axis7.3 of the first optical element unit 7 and the second optical axis 8.3of the second optical element unit 8 are adjusted to be collinear as aspecial case of parallelism to define parts of the straight optical axisof the optical projection system 2.

In the embodiment shown, the first interface 3.4 has a first interfaceaxis collinear with the second optical axis 7.3 and with the firsthousing axis 3.2. Furthermore, the third interface has a secondinterface axis collinear with the first housing axis 3.2 and the thirdoptical axis 8.3 and, thus, collinear with the first interface axis.However, it will be appreciated that, depending on the required geometryof the light path other alignments of the interface surfaces, theinterface axes and the optical axes, respectively, may be provided bysimple adjustments of the respective coupling between the opticalelement unit and the housing.

This arrangement with the second optical axis 7.3 and the third opticalaxis 8.3 being collinear with the first housing axis 3.2 forming asymmetry axis of the first optical element module 3, despite theoff-axis arrangement of the mirrors 10.1 and 10.2, provides for aprojection unit 2 that has a substantially rotationally symmetric outershape over its entire length. In a view along the collinear secondoptical axes 7.3 and 8.3, the outer shape of the first optical elementmodule 3 is concentric with the outer shape of the optical element units7 and 8. As has been outline above, this maintained outer symmetrydesign greatly simplifies the manufacture of the projection unit 2 andprovides considerable advantages in terms of dynamic and thermalbehavior with respect to known asymmetric designs.

At its lower side, the housing 3.1 furthermore provides auxiliaryinterfaces 3.8, each with a simple planar auxiliary interface surface3.9. Each auxiliary interface surface 3.9 forms a rest interface for thesupport unit 3. At each auxiliary interface 3.9 the support unit 3 and,thus, the optical projection system 2 is coupled to a support element 11defining the position of the optical projection system 2 in space. Eachauxiliary interface surface 3.9 also forms a reference interface for thesupport unit 3.

The auxiliary interface surfaces 3.9 are separated from but coplanarwith the second interface surface 3.7. Thus, all the interface surfaces3.7 and 3.9 at the lower side of the housing 3.1 may be manufactured inone common step adding to the overall accuracy of the system. To avoidadverse run-on effects during manufacturing affecting the surfacequality of the respective interface surface, the surfaces are providedwith inclined ramps and/or overruns at their periphery.

It will be appreciated that the above design with coplanar interfacesurfaces is of particular advantage. However, it will also beappreciated that, with other embodiments of the present invention, othersurface configurations may be chosen. Preferably, at least the first andsecond interface surface forming the support interface for therespective optical element unit protrudes further from the housing thanany other part of the housing in order to provide easy access to thissurface during its manufacture, e.g. with a large grinding machine etc.

It will be appreciated that further easily accessible externalinterfaces may be provided at the housing unit 3.1 for arbitrarypurposes such as for metrology purposes etc. Furthermore, interfaces maybe provided for external supports externally supporting the opticalelement units as indicated in FIG. 1 by the dashed contours 12.

The housing unit 3.1 is manufactured of a plurality of ceramicallybonded sections made of a ceramic material comprising SiC. Thesesections are prepared in a low shrinkage near-net-shape casting process.Parts of the housing unit 3.1 are then processed, e.g. milled or thelike, to provide desired shape. Then, the housing unit 3.1 is ceramizedin a low shrinkage near-net-shape reaction infiltration process. Thus,the housing unit 3.1 has a high modulus of elasticity, a high thermalconductivity and a low thermal expansion coefficient. Due to itsstrength and rigidity, during mounting the optical element units, thehousing unit 3.1 may be freely positioned, in particular rotated, inspace to provide easy access to the respective areas to be worked on.

The housing unit 3.1 is of monolithic design. However, it will beappreciated that, with other embodiments of the present invention, thehousing may be composed of a plurality of separable components, e.g. intwo components as it is indicated in FIG. 1 by the dashed contour 3.10.With such an embodiment, the distance between the two mirrors 10.1 and10.2 may be adjusted by introducing one or more spacer elements betweenthe components of the housing. Furthermore, the housing may be composedof a three separable components as it is indicated in FIG. 1 by thedot-dashed contours 3.11. With such a configuration, the housing may beeasily composed of two simple plate-like components and one simpletubular component.

In the following several examples of optical projection systemsaccording to the present invention will be described to explain furtherpreferred arrangements of the optical sub-systems of the opticalprojection system. The components of these optical projection systems,in their design and functionality, correspond to the components of theembodiments described above in the context of FIG. 1. All those opticalprojection systems are suitable for being applied in an optical exposureapparatus according to the present invention as it has been describedabove in the context of FIG. 1.

Second Embodiment

FIG. 2 is a schematic view of a second preferred embodiment of acatadioptric optical projection unit 102 according to the presentinvention with a support unit 103 according to the present invention,the support unit 103 again forming a first optical element moduleaccording to the present invention.

The optical projection unit 102 again comprises two refractive opticalsub-systems in the form of two elongated optical element units, namely afirst optical element unit 107 and a second optical element unit 108mounted to and supported by the support unit 103 comprising a housing103.1. The optical element units 107 and 108, again, are composed of astack of second optical element modules 107.1 and 108.1, respectively.

As with the embodiments described above, each optical element unit 107,108 comprises a stack of second optical element modules 107.1 and 108.1,respectively, connected to each other. Each of said second opticalelement modules comprises one or more optical elements as well as asupport frame supporting said optical element. The first optical elementunit 107 has an optical axis 107.3 defined by its optical elements,while the second optical element unit 108 has an optical axis 108.3 alsodefined by its optical elements. The optical axis 107.3 is collinearwith the optical axis 108.3

The first optical element module 103 comprises a rotationally symmetricfirst housing unit 103.1 with a central axis of symmetry in the form ofa first housing axis 103.2 that is collinear with the optical axes 107.3and 108.3.

The first optical element module 103 further comprises a catadioptricoptical sub-system 110 of the optical projection unit 102. To this endit comprises a plurality of first optical elements in the form ofreflecting elements 110.1 and 110.2 and one or more refractive elements110.15, e.g. lenses. All these first optical elements 110.1, 110.2,110.15 have optical axes that are inclined with respect to the firsthousing axis 103.2. In particular, the reflecting element and 110.2 andthe refractive element(s) 110.15 have a common first optical axis 110.14that is perpendicular to the first housing axis 103.2 and, thus,perpendicular to both, the optical axis 107.3 and the optical axis108.3.

All the first optical elements 110.1, 110.2, 110.15 are mounted to thefirst housing unit 103.1 by suitable supports in a staticallydeterminate way.

The support unit 103 comprises a steel housing unit 103.1 of sufficientrigidity and strength to take the loads of the first optical elementunit 107 and the second optical element unit 108. Each optical elementunit 107, 108 is mounted to the housing unit 103.1 via a flange portionlocated at its innermost optical element module such that the opticalelement unit 107 and 108, respectively, does substantially not protrudeinto the housing unit 103.1. Thus, the dimensions of the housing may bekept small reducing the expense for the housing unit 103.1.

Furthermore, the housing unit 103.1 is optically functional. To thisend, it forms a gas tight and light tight enclosure of the part of thelight path between the first optical element unit 107 and the secondoptical element unit 108. To provide this gas and light tightness, theoptical element units 107 and 108 are mounted to the housing unit in asgas and light tight manner via coupling elements as it has beendescribed above. Thus, in other words, the housing unit 103.1 integratesthe function of supporting the optical element units 107 and 108 and thefunction of enclosing said third part of the light path between thelatter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing unit 103.1 providesauxiliary interfaces, each with a simple planar auxiliary interfacesurface 103.9. Each auxiliary interface surface 103.9 forms a restinterface for the support unit 103. At each auxiliary interface 103.9the support unit 103 and, thus, the optical projection unit 102 iscoupled to a support element 111 defining the position of the opticalprojection unit 102 in space. Each auxiliary interface surface 103.9also forms a reference interface for the support unit 103.

Third Embodiment

FIG. 3 is a schematic view of a third preferred embodiment of acatadioptric optical projection unit 202 according to the presentinvention with a support unit 203 according to the present invention,the support unit 203 again forming a first optical element moduleaccording to the present invention.

The optical projection unit 202 again comprises two refractive opticalsub-systems in the form of two elongated optical element units, namelyan a first optical element unit 207 and a second optical element unit208 mounted to and supported by the support unit 203 comprising ahousing 203.1. The optical element units 207 and 208, again, arecomposed of a stack of second optical element modules 207.1 and 208.1,respectively.

As with the embodiments described above, each optical element unit 207,208 comprises a stack of second optical element modules 207.1 and 208.1,respectively, connected to each other. Each of said second opticalelement modules comprises one or more optical elements as well as asupport frame supporting said optical element. The first optical elementunit 207 has an optical axis 207.3 defined by its optical elements,while the second optical element unit 208 has an optical axis 208.3 alsodefined by its optical elements. The optical axis 207.3 is collinearwith the optical axis 208.3

The first optical element module 203 comprises a rotationally symmetricfirst housing unit 203.1 with a central axis of symmetry in the form ofa first housing axis 203.2 that is collinear with the optical axes 207.3and 208.3.

The first optical element module 203 further comprises a catadioptricoptical sub-system 210 of the optical projection unit 202. To this endit comprises a plurality of first optical elements in the form of aplurality of reflecting elements 210.1, 210.2, 210.16, 210.17 and aplurality refractive elements 210.15 and 210.18, e.g. lenses. All thesefirst optical elements 210.1, 210.2, 210.15, 210.16, 210.17, 210.18 haveoptical axes that are inclined with respect to the first housing axis203.2 and, thus, inclined with respect to both, the optical axis 207.3and the optical axis 208.3.

All the first optical elements 210.1, 210.2, 210.15, 210.16, 210.17,210.18 are mounted to the first housing unit 203.1 by suitable supportsin a statically determinate way via ring shaped holders 210.19, 210.20,210.21, respectively, in a manner similar to the one as it has beendescribed above in the context of FIG. 1.

The support unit 203 again comprises a steel housing unit 203.1 ofsufficient rigidity and strength to take the loads of the first opticalelement unit 207 and the second optical element unit 208. Each opticalelement unit 207, 208 is mounted to the housing unit 203.1 via a flangeportion located at its innermost optical element module such that theoptical element unit 207 and 208, respectively, does substantially notprotrude into the housing unit 203.1. Thus, the dimensions of thehousing may be kept small reducing the expense for the housing unit203.1.

The housing unit 203.1, according to the invention, is arranged suchthat its outer shape, despite the off-axis arrangement of the firstoptical elements 210.1, 210.2, 210.15, 210.16, 210.17, 210.18, issubstantially flush with the outer shape of the optical element units207 and 208. Thus, a very compact symmetrical design with advantageousthermal and dynamic behavior is achieved.

Furthermore, the housing unit 203.1 is optically functional. To thisend, it forms a gas tight and light tight enclosure of the part of thelight path between the first optical element unit 207 and the secondoptical element unit 208. To provide this gas and light tightness, theoptical element units 207 and 208 are mounted to the housing unit in asgas and light tight manner via coupling elements as it has beendescribed above. Thus, in other words, the housing unit 203.1 integratesthe function of supporting the optical element units 207 and 208 and thefunction of enclosing said third part of the light path between thelatter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing unit 203.1 has a radiallyprotruding rotationally symmetric flange portion that provides auxiliaryinterfaces, each with a simple planar auxiliary interface surface 203.9.Each auxiliary interface surface 203.9 forms a rest interface for thesupport unit 203. At each auxiliary interface 203.9 the support unit 203and, thus, the optical projection unit 202 is coupled to a supportelement 211 defining the position of the optical projection unit 202 inspace. Each auxiliary interface surface 203.9 also forms a referenceinterface for the support unit 203.

Fourth Embodiment

In the following, a fourth preferred embodiment of an optical exposureapparatus 301 according to the present invention comprising acatadioptric optical projection system 302 according to the presentinvention with a support unit 303 according to the present inventionwill be described with reference to FIG. 4. In its basic design andfunctionality, this second embodiment does not differ from theembodiment described with reference to FIG. 1.

The optical exposure apparatus 301 is adapted to transfer an image of apattern formed on a mask 304 onto a substrate 308. To this end, theoptical exposure apparatus 305 comprises an illumination system 306illuminating said mask and the optical projection system 302. Theoptical projection system 302 projects the image of the pattern formedon the mask 304 onto the substrate 305, e.g. a wafer or the like.

The optical projection system 302 comprises four optical sub-systems inthe form of four lens units, namely a first lens unit 307, a second lensunit 308 and two third lens units 313 mounted to and supported by thesupport unit 303. The first lens unit 307 and the second lens unit 308form a first lens unit pair, while the two third lens units 313 form ansecond lens unit pair. The optical projection system 302, again,receives the part of the light path between the mask 304 and thesubstrate 305.

Each lens unit 307, 308 and 313 comprises a stack of lens modules 307.1,308.1 and 313.1, 313.4, respectively, connected to each other. Each ofsaid lens modules 307.1, 308.1 and 313.1, respectively, comprises a lens307.2, 308.2 and 313.2, respectively, as well as a support framesupporting said lens 307.2, 308.2 and 313.2, respectively. The firstlens unit has a first optical axis 307.3, while the second lens unit 308has a second optical axis 308.3. The third lens modules 313.1 have thirdoptical axes 313.3. The third lens modules 313.4 at the outer end of therespective lens unit 313 further comprise a reflective element 313.5.

At least some of the lenses 307.2, 308.2 and 313.2 as well as thereflective elements 313.5, respectively, are actively positioned duringoperation of the exposure apparatus 306 by means of active positioningdevices controlled by a corresponding control device (not shown). Tothis end, the control device may receive information representative ofthe actual imaging quality provided by the optical projection system 302and control the operation of the active positioning devices of therespective lens module 307.1, 308.1 and 313.2 as well as the reflectiveelements 313.5, respectively, in response to this information.

The support unit 303 comprises a housing 303.1 of sufficient rigidityand strength to take the loads of the first lens unit 307, the secondlens unit 308 and the third lens units 313. Furthermore, the housing303.1 is optically functional. To this end, it forms a gas tight andlight tight enclosure of the part of the light path between the firstlens unit 307 and the second lens unit 308. To provide this gas andlight tightness, the first lens unit 307, the second lens unit 308 andthe third lens units 313 all are mounted to the housing in as gas andlight tight manner via coupling elements 309 as disclosed in the Germanpatent application No. 103 52 820.2, filed on Nov. 11, 2003, thedisclosure of which is incorporated herein by reference. These couplingelements 309 also provide for a thermal deformation decoupling of thehousing and the respective lens unit 307, 308 and 313. Thus, in otherwords, the housing 303.1 integrates the function of supporting the firstlens unit 307 and the second lens unit 308 and the function of enclosingthe light path between the latter in a gas tight and light tight manner.

A further optical sub-system 310 of the catadioptric optical projectionsystem 302 is located within the housing 303.1. This further opticalsub-system is formed by a prism 310.1. This prism 310.1 is mounted tothe housing 303.1 by three suitable supports 310.3 in a staticallydeterminate way, namely in an isostatic manner. It will be appreciatedthat, with other embodiments of the present invention, the beam splittermay be mounted to a frame which is, in turn, mounted in a staticallydeterminate way to the housing.

The housing 303.1, at its upper side, provides a first interface 303.2with a simple planar first interface surface 303.3. This first interface303.2 forms a first support interface for the first lens unit 307. Atits lower side, the housing 303.1 provides a second interface 303.4 witha simple planar second interface surface 303.5. This second interface303.4 forms a second support interface for the second lens unit 308. Thehousing 303.1, at opposite vertical sides, provides third interfaces303.8 with a simple planar third interface surface 303.9. Each thirdinterface 303.8 forms a third support interface for one of the thirdlens units 313. These planar interface surfaces 303.3, 303.5 and 303.9are easy to manufacture e.g. by corresponding manufacturing processessuch as turning, milling, grinding, polishing etc. or combinationsthereof. They add to the overall simplicity of the design.

The first interface surface 303.3 is parallel to the second interfacesurface 303.5. Furthermore, the first optical axis 307.3 of the firstlens unit 307 and the second optical axis 308.3 of the second lens unit308 are adjusted to be transversely offset and parallel to a firstdirection. In the embodiment shown, the first interface has a firstinterface axis collinear with the first optical axis 307.3. Furthermore,the second interface has a second interface axis collinear with thesecond optical axis 308.3 and, thus, transversely offset and parallel tothe first interface axis. The third optical axes 313.3 of the third lensunits 313 are collinear and parallel to a second direction.

The respective first interface surface 303.3 is perpendicular to thethird interface surface 303.9. Furthermore, the first direction extendstransversely to the second direction. In particular, the first directionis substantially perpendicular to the second direction. Thus, the firstoptical axis 307.3 of the first lens unit 307 and the third optical axis313.3 of the third lens unit 313 are adjusted to be substantiallyperpendicular. In the embodiment shown, the first interface has a firstinterface axis collinear with the first optical axis 307.3. Furthermore,the third interface has a third interface axis collinear with the thirdoptical axis 313.3 and, thus, perpendicular to the first interface axis.

However, it will be appreciated that, depending on the required geometryof the light path other alignments of the interface surfaces, theinterface axes and the optical axes, respectively, may be provided bysimple adjustments of the respective coupling between the lens unit andthe housing.

At its lower side, the housing 303.1 furthermore provides two auxiliaryinterfaces 303.6, each with a simple planar auxiliary interface surface303.7. Each auxiliary interface surface 303.7 forms a rest interface forthe support unit 303. At each auxiliary interface 303.7 the support unit303 and, thus, the optical projection system 302 is coupled to a supportelement 311 defining the position of the optical projection system 302in space. Each auxiliary interface surface 303.7 also forms a referenceinterface for the support unit 303.

The auxiliary interface surfaces 303.7 are separated from but coplanarwith the second interface surface 303.5. Thus, all the interfacesurfaces 303.5 and 303.7 at the lower side of the housing 303.1 may bemanufactured in one common step adding to the overall accuracy of thesystem. To avoid adverse run-on effects during manufacturing affectingthe surface quality of the respective interface surface, the surfacesare provided with inclined ramps at their periphery.

It will be appreciated that the above design with coplanar interfacesurfaces is of particular advantage. However, it will also beappreciated that, with other embodiments of the present invention, othersurface configurations may be chosen. Preferably, at least the first andsecond interface surface forming the support interface for therespective lens unit protrudes further from the housing than any otherpart of the housing in order to provide easy access to this surfaceduring its manufacture, e.g. with a large grinding machine etc.

It will be appreciated that further easily accessible externalinterfaces may be provided at the housing 303.1 for arbitrary purposessuch as for metrology purposes etc. Furthermore, interfaces may beprovided for external supports externally supporting the lens units.

The housing 303.1 is a monolithic housing made of a ceramic materialcomprising SiC. The housing 303.1 is prepared in a low shrinkagenear-net-shape casting process. Parts of the housing 303.1 are thenprocessed, e.g. milled or the like, to provide the desired shape. Thehousing 303.1 is then ceramized in a low shrinkage near-net-shapereaction infiltration process. Thus, the housing 303.1 has a highmodulus of elasticity, a high thermal conductivity and a low thermalexpansion coefficient.

Due to its strength and rigidity, during mounting the lens units, thehousing 303.1 may be freely positioned, in particular rotated, in spaceto provide easy access to the respective areas to be worked on. Toprovide easy positioning of the respective lens unit during the processof mounting it to the housing 303.1, the respective interface 303.2,303.4 and 303.8 has an air bearing unit which may be connected to asource 314 of pressurized air or the like.

In the foregoing, the present invention has been described in thecontext of two embodiments having two and four lens units, respectively.However, it will be appreciated that other variants of the invention maycomprise another number of lens units supported by the support unit.

In the following several examples of optical projection systemsaccording to the present invention will be described to explain furtherpreferred arrangements of the optical sub-systems of the opticalprojection system. The components of these optical projection systems,in their design and functionality, correspond to the components of theembodiments described above in the context of FIGS. 1 and 4. All thoseoptical projection systems are suitable for being applied in an opticalexposure apparatus according to the present invention as it has beendescribed above in the context of FIGS. 1 and 4.

Fifth Embodiment

FIG. 5 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 402 according tothe present invention with a support unit 403 according to the presentinvention.

The optical projection system 402 comprises two refractive opticalsub-systems in the form of two elongated lens units, namely a first lensunit in the form of a first lens unit 407 and a second lens unit in theform of a second lens unit 408 mounted to and supported by the supportunit 403 comprising a housing 403.1. The optical projection system 402further comprises a third optical sub-system, namely a third lens unitin the form of a third lens unit 413.

A fourth optical sub-system 410 forming a reflective part of thecatadioptric optical projection system 402 is located within the housing403.1. This further optical sub-system is formed by a reflective elementin the form a prism 410. The prism 410 defines the shape of the lightpath within the housing 403.1. It is mounted to the housing 403.1 bysuitable supports in a statically determinate way.

As with the embodiments described above, each lens unit 407, 408, 413comprises a stack of lens modules connected to each other. Each of saidlens modules comprises a lens as well as a support frame supporting saidlens. The third lens unit 413 at its outer end further comprises areflective element 413.5. The first lens unit 407 has a first opticalaxis 407.3, while the second lens unit 408 has a second optical axis408.3 and the third lens unit 413 has a third optical axis 413.3. Thefirst optical axis 407.3 is collinear with the second optical axis408.3, while the third optical axis 413.3 is perpendicular to both, thefirst optical axis 407.3 and the second optical axis 408.3.

The support unit 403 comprises a steel housing 403.1 of sufficientrigidity and strength to take the loads of the first lens unit 407, thesecond lens unit 408 and the third lens unit 413. Each lens unit 407,408 and 413 is mounted to the housing 403.1 via a flange portion locatedat its innermost lens module such that the lens unit 407, 408 and 413,respectively, does substantially not protrude into the housing 403.1.Thus, the dimensions of the housing may be kept small reducing theexpense for the housing 403.1.

Furthermore, the housing 403.1 is optically functional. To this end, itforms a gas tight and light tight enclosure of the part of the lightpath between the first lens unit 407 and the second lens unit 408. Toprovide this gas and light tightness, the lens units 407, 408 and 413are mounted to the housing in as gas and light tight manner via couplingelements as it has been described above. Thus, in other words, thehousing 403.1 integrates the function of supporting the lens units 407,408 and 413 and the function of enclosing said third part of the lightpath between the latter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing 403.1 provides auxiliaryinterfaces, each with a simple planar auxiliary interface surface 403.7.Each auxiliary interface surface 403.7 forms a rest interface for thesupport unit 403. At each auxiliary interface 403.7 the support unit 403and, thus, the optical projection system 402 is coupled to a supportelement 411 defining the position of the optical projection system 402in space. Each auxiliary interface surface 403.7 also forms a referenceinterface for the support unit 403.

Sixth Embodiment

FIG. 6 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 502 according tothe present invention with a support unit 503 according to the presentinvention. This embodiment largely corresponds to the embodiment of FIG.5. Thus, like components have been designated with it the same referencenumerals added by a dash and it is here mainly referred to thedifferences only.

A main difference lies within the connection of the lens units 507, 508and 513 to the housing 503.1. Each lens unit 507, 508 and 513 is mountedto the housing 503.1 via a flange portion located at a more central lensmodule of the lens unit 507, 508 and 513, respectively. Thus, the lensunit 507, 508 and 513, respectively, protrudes into the housing 503.1.Although the dimensions of the housing 503.1 increase compared to thehousing 503.1 of FIG. 5, this configuration has advantages with respectto the vibration behavior of the optical projection system 502. Thus,external supports 12, as described in the context of FIG. 1, may beavoided.

Seventh Embodiment

FIG. 7 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 602 according tothe present invention with a support unit 603 according to the presentinvention. This embodiment largely corresponds to the embodiment of FIG.5. Thus, like components have been designated with it the same referencenumerals added by two dashes and it is here mainly referred to thedifferences only.

A main difference lies within the connection of the lens units 607, 608and 613 to the housing 603.1 and the size of the housing 603.1. Eachlens unit 607, 608 and 613 is mounted to the housing 603.1 via a flangeportion located at the lens module at the outward end of the lens unit607, 608 and 613, respectively. Thus, the lens unit 607, 608 and 613,respectively, substantially extends within the housing 603.1. Althoughthe dimensions of the housing 603.1 considerably increase compared tothe housing 603.1 of FIG. 5, this configuration has the advantage thatthe lens units 607, 608 and 613 are protected from external influencesby the housing 603.1. In particular, certain given or preferredenvironmental conditions for the optical projection system 602 mayeasily be maintained within the housing 603.1.

Eighth Embodiment

FIG. 8 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 702 according tothe present invention with a support unit 703 according to the presentinvention.

The optical projection system 702 comprises two refractive opticalsub-systems in the form of two elongated lens units, namely a first lensunit in the form of a first lens unit 707 and a second lens unit in theform of a second lens unit 708 mounted to and supported by the supportunit 703 comprising a housing 703.1. The optical projection system 702further comprises two third optical sub-systems, namely two third lensunits in the form of two third lens units 713.

A fourth optical sub-system 710 forming a reflective part of thecatadioptric optical projection system 702 is located within the housing703.1. This further optical sub-system is formed by a reflective elementin the form a double sided mirror 710. The mirror 710 defines the shapeof the light path within the housing 703.1. It is mounted to the housing703.1 by suitable supports in a statically determinate way.

As with the embodiments described above, each lens unit 707, 708, 713comprises a stack of lens modules connected to each other. Each of saidlens modules comprises a lens as well as a support frame supporting saidlens. The third lens units 713 at their outer end further comprise areflective element 713.5. The first lens unit 707 has a first opticalaxis 707.3, while the second lens unit 708 has a second optical axis708.3 and each third lens unit 713 has a third optical axis 713.3. Thefirst optical axis 707.3 is collinear with the second optical axis708.3, while the third optical axes 713.3 are collinear with each otherbut perpendicular to both, the first optical axis 707.3 and the secondoptical axis 708.3.

The support unit 703 comprises a steel housing 703.1 of sufficientrigidity and strength to take the loads of the first lens unit 707, thesecond lens unit 708 and the third lens unit 713. Each lens unit 707,708 and 713 is mounted to the housing 703.1 via a flange portion locatedat its innermost lens module such that the lens unit 707, 708 and 713,respectively, does substantially not protrude into the housing 703.1.Thus, the dimensions of the housing may be kept small reducing theexpense for the housing 703.1.

Furthermore, the housing 703.1 is optically functional. To this end, itforms a gas tight and light tight enclosure of the part of the lightpath between the first lens unit 707 and the second lens unit 708. Toprovide this gas and light tightness, the lens units 707, 708 and 713are mounted to the housing in as gas and light tight manner via couplingelements as it has been described above. Thus, in other words, thehousing 703.1 integrates the function of supporting the lens units 707,708 and 713 and the function of enclosing said third part of the lightpath between the latter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing 703.1 provides auxiliaryinterfaces, each with a simple planar auxiliary interface surface 703.7.Each auxiliary interface surface 703.7 forms a rest interface for thesupport unit 703. At each auxiliary interface 703.7 the support unit 703and, thus, the optical projection system 702 is coupled to a supportelement 711 defining the position of the optical projection system 702in space. Each auxiliary interface surface 703.7 also forms a referenceinterface for the support unit 703.

Ninth Embodiment

FIG. 9 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 802 according tothe present invention with a support unit 803 according to the presentinvention.

The optical projection system 802 comprises two refractive opticalsub-systems in the form of two elongated lens units, namely a first lensunit in the form of a first lens unit 807 and a second lens unit in theform of a second lens unit 808 mounted to and supported by the supportunit 803 comprising a housing 803.1. The optical projection system 802further comprises a third optical sub-system, namely a third lens unitin the form of a third lens unit 813.

A fourth optical sub-system 810 forming a reflective part of thecatadioptric optical projection system 802 is located within the housing803.1. This further optical sub-system comprises a reflective element inthe form of a mirror 810.1 and a beam splitter 810.2. The mirror 810.1and the beam splitter 810.2 define the shape of the light path withinthe housing 803.1. They are mounted to the housing 803.1 by suitablesupports in a statically determinate way.

As with the embodiments described above, each lens unit 807, 808, 813comprises a stack of lens modules connected to each other. Each of saidlens modules comprises a lens as well as a support frame supporting saidlens. The third lens unit 813 at its outer end further comprises areflective element 813.5. The first lens unit 807 has a first opticalaxis 807.3, while the second lens unit 808 has a second optical axis808.3 and the third lens unit 813 has a third optical axis 813.3. Thefirst optical axis 807.3 is parallel and transversely offset to thesecond optical axis 808.3, while the third optical axis 813.3 isperpendicular to both, the first optical axis 807.3 and the secondoptical axis 808.3.

The support unit 803 comprises a ceramic housing 803.1 of sufficientrigidity and strength to take the loads of the first lens unit 807, thesecond lens unit 808 and the third lens unit 813. Each lens unit 807,808 and 813 is mounted to the housing 803.1 via a flange portion locatedat its innermost lens module such that the lens unit 807, 808 and 813,respectively, does substantially not protrude into the housing 803.1.Thus, the dimensions of the housing may be kept small reducing theexpense for the housing 803.1.

Furthermore, the housing 803.1 again is optically functional. To thisend, it forms a gas tight and light tight enclosure of the part of thelight path between the first lens unit 807 and the second lens unit 808.To provide this gas and light tightness, the lens units 807, 808 and 813are mounted to the housing in as gas and light tight manner via couplingelements as it has been described above. Thus, in other words, thehousing 803.1 integrates the function of supporting the lens units 807,808 and 813 and the function of enclosing said third part of the lightpath between the latter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing 803.1 provides auxiliaryinterfaces, each with a simple planar auxiliary interface surface 803.7.Each auxiliary interface surface 803.7 forms a rest interface for thesupport unit 803. At each auxiliary interface 803.7 the support unit 803and, thus, the optical projection system 802 is coupled to a supportelement 811 defining the position of the optical projection system 802in space. Each auxiliary interface surface 803.7 also forms a referenceinterface for the support unit 803.

Tenth Embodiment

FIG. 10 is a schematic partially sectional view of a further preferredembodiment of a catadioptric optical projection system 902 according tothe present invention with a support unit 903 according to the presentinvention.

The optical projection system 902 comprises two refractive opticalsub-systems in the form of two elongated lens units, namely a first lensunit in the form of a first lens unit 907 and a second lens unit in theform of a second lens unit 908 mounted to and supported by the supportunit 903 comprising a housing 903.1. The optical projection system 902further comprises a third optical sub-system, namely a third lens unitin the form of a third lens unit 913.

A fourth optical sub-system 910 forming a reflective part of thecatadioptric optical projection system 902 is located within the housing903.1. This further optical sub-system comprises two reflective opticalelements in the form of a prism 910.1 and a mirror 910.2 as well as arefractive optical element in the form of a lens or lens group 910.3.The prism 910.1, the mirror 910.2 and the lens or lens group 910.3define the shape of the light path within the housing 903.1. They aremounted to the housing 903.1 by suitable supports in a staticallydeterminate way.

As with the embodiments described above, each lens unit 907, 908, 913comprises a stack of lens modules connected to each other. Each of saidlens modules comprises a lens as well as a support frame supporting saidlens. The third lens unit 913 at its outer end further comprises areflective element 913.5. The first lens unit 907 has a first opticalaxis 907.3, while the second lens unit 908 has a second optical axis908.3 and the third lens unit 913 has a third optical axis 913.3. Thefirst optical axis 907.3 is collinear with the second optical axis908.3, while the third optical axis 913.3 is parallel and transverselyoffset to both, the first optical axis 907.3 and the second optical axis908.3.

The support unit 903 comprises a steel housing 903.1 of sufficientrigidity and strength to take the loads of the first lens unit 907, thesecond lens unit 908 and the third lens unit 913. Each lens unit 907,908 and 913 is mounted to the housing 903.1 via a flange portion locatedat its innermost lens module such that the lens unit 907, 908 and 913,respectively, does substantially not protrude into the housing 903.1.Thus, the dimensions of the housing may be kept small reducing theexpense for the housing 903.1.

Furthermore, the housing 903.1 again is optically functional. To thisend, it forms a gas tight and light tight enclosure of the part of thelight path between the first lens unit 907 and the second lens unit 908.To provide this gas and light tightness, the lens units 907, 908 and 913are mounted to the housing in as gas and light tight manner via couplingelements as it has been described above. Thus, in other words, thehousing 903.1 integrates the function of supporting the lens units 907,908 and 913 and the function of enclosing said third part of the lightpath between the latter in a gas tight and light tight manner.

Furthermore, at its lower side, the housing 903.1 provides auxiliaryinterfaces, each with a simple planar auxiliary interface surface 903.7.Each auxiliary interface surface 903.7 forms a rest interface for thesupport unit 903. At each auxiliary interface 903.7 the support unit 903and, thus, the optical projection system 902 is coupled to a supportelement 911 defining the position of the optical projection system 902in space. Each auxiliary interface surface 903.7 also forms a referenceinterface for the support unit 903.

Eleventh Embodiment

In the following, a further preferred embodiment of an optical exposureapparatus 1001 according to the present invention comprising acatadioptric optical projection system 1002 according to the presentinvention with a support unit 1003 according to the present inventionwill be described with reference to FIG. 11. In its basic design andfunctionality, this embodiment does not differ from the embodimentdescribed with reference to FIG. 1. Thus, like components have beendesignated with it the same reference numerals raised by 1000 and it ishere mainly referred to the differences only.

The optical exposure apparatus 1001 is adapted to transfer an image of apattern formed on a mask 1004 onto a substrate 1008. To this end, theoptical exposure apparatus 1005 comprises an illumination system 1006illuminating said mask and the optical projection system 1002. Theoptical projection system 1002 projects the image of the pattern formedon the mask 1004 onto the substrate 1005, e.g. a wafer or the like.

The optical projection system 1002 comprises two optical sub-systems inthe form of two elongated lens units, namely a first lens unit in theform of a first lens unit 1007 and a second lens unit in the form of asecond lens unit 1008 mounted to and supported by the support unit 1003.

The optical projection system 1002 receives the part of the light pathbetween the mask 1004 and the substrate 1005. In particular, the firstlens unit 1007 receives a first part of said light path while the secondlens unit 1008 receives a second part of said light path. The supportunit 1003 receives a third part of said light path located between thefirst lens unit 1007 and the second lens unit 1008.

Each lens unit 1007, 1008 comprises a stack of lens modules 1007.1 and1008.1, respectively, connected to each other. Each of said lens modules1007.1 and 1008.1, respectively, comprises a lens 1007.2 and 1008.2,respectively, as well as a support frame supporting said lens 1007.2 and1008.2, respectively. The first lens unit has a first optical axis1007.3, while the second lens unit 1008 has a second optical axis1008.3.

At least some of the lenses 1007.2 and 1008.2, respectively, areactively positioned during operation of the exposure apparatus 1006 bymeans of active positioning devices controlled by a correspondingcontrol device (not shown). To this end, the control device may receiveinformation representative of the actual imaging quality provided by theoptical projection system 1002 and control the operation of the activepositioning devices of the respective lens module 1007.1 and 1008.1,respectively, in response to this information.

The support unit 1003 comprises a support part 1003.1 centrally arrangedwithin the optical projection system 1002. This support part 1003.1 isof sufficient rigidity and strength to take the loads of the first lensunit 1007 and the second lens unit 1008. The support part 3.1 comprisesan upper support plate 1003.13 and a lower support plate 1003.14. Thesesupport plates 1003.13 and 1003.14 are connected via a plurality ofsupport struts 1003.15 evenly distributed at the circumference of thesupport part 1003.1. The connection may be provided by any suitablemeans. In particular, it may be provided as it is disclosed in DE 198 30719 A1, the disclosure of which is incorporated herein by reference.

Furthermore, the support unit 1003 is optically functional. To this end,a separate enveloping part in the form of a bellows 1003.16 is mountedbetween the upper support plate 1003.13 and the and the lower supportplate 1003.14. The bellows 1003.16 together with the upper support plate1003.13 and the and the lower support plate 1003.14 forms a gas tightand light tight envelope of the part of the light path between the firstlens unit 1007 and the second lens unit 1008. To provide said gas andlight tightness, the first lens unit 1007 and the second lens unit 1008,both, are mounted to the support unit 1003 in a gas and light tightmanner via coupling elements 1009 as disclosed in the German patentapplication No. 103 52 820.2, filed on Nov. 11, 2003, the disclosure ofwhich is incorporated herein by reference. These coupling elements 1009also provide for a thermal deformation decoupling of the support unit1003 and the respective lens unit 1007, 1008. Thus, in other words, thesupport unit 1003 integrates the function of supporting the first lensunit 1007 and the second lens unit 1008 and the function of envelopingsaid third part of the light path between the latter in a gas tight andlight tight manner.

A further optical sub-system 1010 forming the reflective part of thecatadioptric optical projection system 1002 is located within thesupport unit 1003. This further optical sub-system is formed by tworeflective elements in the form of mirrors 1010.1 and 1010.2. Thesemirrors 1010.1 and 1010.2 define the shape of the light path within thesupport unit 1003. Both mirrors 1010.1 and 1010.2 are mounted to thesupport unit 1003 by three suitable supports 1010.3 in a staticallydeterminate way, namely in an isostatic manner.

It will be appreciated that, with other embodiments of the presentinvention, the mirrors may be mounted to mirror frames which are, inturn, mounted in a statically determinate way to the support unit.Furthermore, it will be appreciated that, with other embodiments of thepresent invention, one or both of the mirrors may be mounted to thesupport unit in a statically indeterminate way. For example, astatically overdeterminate mounting may be used to introduce defineddeformations into the respective mirror.

The further optical sub-system 1010 forming the reflective part of thecatadioptric optical projection system 1002 only comprises reflectiveoptical elements. However, it will be appreciated that, with otherembodiments of the present invention, the further optical sub-systemlocated within the support unit may also comprise other opticalelements, e.g. refractive optical elements such as lenses etc. ordiffractive optical elements etc.

The upper support plate 1003.13 provides a first interface 1003.2 with asimple planar first interface surface 1003.3. This first interface1003.2 forms a first support interface for the first lens unit 1007. Thefirst interface 1003.2 also forms a first passage for the light pathfrom the first lens unit 1007 to the support unit 1003.

At the lower side of the support unit 1003, opposite to the firstinterface 1003.2, the lower support plate 1003.14 provides a secondinterface 1003.4 with a simple planar second interface surface 1003.5.This second interface 1003.4 forms a second support interface for thesecond lens unit 1008. The second interface 1003.4 also forms a secondpassage for the light path from the support unit 1003 to the second lensunit 1008.

The first interface surface 1003.3 is parallel to the second interfacesurface 1003.5. Furthermore, the first optical axis 1007.3 of the firstlens unit 1007 and the second optical axis 1008.3 of the second lensunit 1008 are adjusted to assume a predetermined positionalrelationship. This predetermined positional relationship may be anynecessary positional relationship, e.g. parallel or inclined withrespect to each other. In the embodiment shown, the first optical axis1007.3 of the first lens unit 1007 the second optical axis 8.3 of thesecond lens unit 1008 are adjusted to be collinear as a special case ofparallelism.

In the embodiment shown, the first interface has a first interface axiscollinear with the first optical axis 1007.3. Furthermore, the secondinterface has a second interface axis collinear with the second opticalaxis 1008.3 and, thus, collinear with the first interface axis. However,it will be appreciated that, depending on the required geometry of thelight path other alignments of the interface surfaces, the interfaceaxes and the optical axes, respectively, may be provided by simpleadjustments of the respective coupling between the lens unit and thesupport unit.

At its lower side, the support unit 1003 furthermore provides auxiliaryinterfaces 1003.6, each with a simple planar auxiliary interface surface1003.7. Each auxiliary interface surface 1003.7 forms a rest interfacefor the support unit 1003. At each auxiliary interface 1003.7 thesupport unit 1003 and, thus, the optical projection system 1002 iscoupled to a support element 1011 defining the position of the opticalprojection system 1002 in space. Each auxiliary interface surface 1003.7also forms a reference interface for the support unit 1003.

The auxiliary interface surfaces 1003.7 are separated from but coplanarwith the second interface surface 1003.5. Thus, all the interfacesurfaces 1003.5 and 1003.7 at the lower side of the support unit 1003may be manufactured in one common step adding to the overall accuracy ofthe system. To avoid adverse run-on effects during manufacturingaffecting the surface quality of the respective interface surface, thesurfaces are provided with inclined ramps and/or overruns at theirperiphery.

Twelfth Embodiment

In the following, a twelfth preferred embodiment of an optical exposureapparatus 1 according to the present invention comprising a catadioptricoptical projection system 2 according to the present invention with asupport unit 3 according to the present invention will be described withreference to FIG. 12. In its basic design and functionality, thisembodiment does not differ from the embodiment described with referenceto FIG. 1. In particular, the majority of the components of the opticalexposure apparatus 1 is identical with the components of the opticalexposure apparatus 1 of FIG. 1. Thus, in FIG. 12, components identicalwith the components of FIG. 1 have been designated with identicalreference numerals and, with respect to these identical components it ishere only referred to the explanation given above in the context ofFIG. 1. As a consequence of this widely identical design it is heremainly referred to the differences only.

The difference with respect to the embodiment of FIG. 1 lies within thedesign of the coupling devices 1109.1 and 1109.2 by which the first lensunit 7 and the second lens unit 8 are respectively mounted to thehousing 3.1. These coupling devices 1109.1 an 1109.2 provide for athermal axial shift compensation along the optical axis 7.3 and 8.3 ofthe respective lens unit 7 and 8 with respect to the housing 3.1 as willbe explained in the following.

The components of the first lens unit 7 and the second lens unit 8forming the outer shell of the respective lens unit 7 and 8 are made ofa first material that has a first coefficient of thermal expansion α₁.The thermal expansion of these components occurring due to a raise inthe temperature within these components, among others, would cause anaxial shift between the points on the first lens unit 7 and the pointson the second lens unit 8 along the optical axes 7.3 and 8.3 of the lensunits 7 and 8 if the respective lens unit 7 and 8 was directly connectedto the housing 3.1. The coupling devices 1109.1 and 1109.2 widely reduceor compensate for this thermal expansion effect by assuring that thecenter point 7.4 of the first lens unit 7 and the center point 8.4 ofthe second lens unit 8 upon thermal expansion substantially keep theiraxial distance with respect to the first interface surface 3.3 and thesecond interface surface 3.5, respectively.

To this end, the first coupling device 1109.1 is formed by a pluralityof coupling units 1109.3 evenly distributed at the circumference of thefirst lens unit 7. Each coupling unit 1109.3 comprises a first couplingelement 1109.4 and a second coupling element 1109.5. The first couplingelement 1109.4, on its first end, is coupled to the first interfacesurface 3.3 of the first interface 3.2 and has a second coefficient ofthermal expansion α₂ different from the first coefficient of thermalexpansion α₁ of the first lens unit 7. The second coupling element1109.5 is coupled with its first end to the second end of the firstcoupling element 1109.4. The second coupling element 1109.5, on itssecond end, is coupled to the first lens unit 7. The second couplingelement 1109.5 has a third coefficient of thermal expansion α₃ differentfrom the first coefficient of thermal expansion α₁ of the first lensunit 7 and the second coefficient of thermal expansion α₂ of the firstcoupling element 1109.4.

With the dimension L₁ of the first lens unit 7, the dimension L₂ of thefirst coupling element 1109.4 and the dimension L₃ of the secondcoupling element 1109.5 given in FIG. 10, the axial height H of thecenter point 7.4 of the first lens unit 7 above the first interfacesurface 3.3 calculates as:H=L ₁ −L ₃ +L ₂.  (1)

As a function of the change in the temperature situation AT and thecoefficient of thermal expansion of the respective component 7, 1109.4and 1109.5, the variation ΔH in the height H of the center point 7.4 ofthe first lens unit 7 above the first interface surface 3.3 calculatesas:ΔH(ΔT;α ₁;α₂;α₃)=ΔL ₁(ΔT;α ₁)−ΔL ₃(ΔT;α ₃)+ΔL ₂(ΔT;α ₂).  (2)

It will be appreciated that the coefficients of thermal expansion α₁, α₂and α₃ and the dimensions L₁, L₂ and L₃ may be selected such that theconditionΔH(ΔT;α ₁;α₂;α₃)=ΔL ₁(ΔT;α ₁)−ΔL ₃(ΔT;α ₃)+ΔL ₂(ΔT;α ₂)=0  (3)is substantially fulfilled.

As an example: when the change in the temperature situation ΔT issubstantially equal for all components, with a reference dimensionL_(1R), a reference dimension L_(2R) and a reference dimension L_(3R) ofthe respective component, Equation (3) may be written as:ΔH=L _(1R)·α₁ −L _(3R)·α₃ +L _(2R)·α₂=0  (3)

With L_(2R)=x L_(1R) and L_(3R)=y L_(1R) Equation (3) may be rewrittenas:ΔH=L _(1R)·α₁ −y·L _(1R)·α₃ +x·L _(1R)·α₂=0.  (4)

Equation (4) may be resolved to provide:

$\begin{matrix}{y = {\frac{\alpha_{1}}{\alpha_{3}} + {x \cdot {\frac{\alpha_{2}}{\alpha_{3}}.}}}} & (5)\end{matrix}$

Thus, it will be appreciated that, e.g. for a given material for theouter shell of the first lens unit 7, reasonable material combinationsand dimensions for the first coupling element 1109.4 and the secondcoupling element 1109.5 may be found. For example, if the outer shell ofthe first lens unit 7 is made of steel, the first coupling element1109.4 is made of Invar and the second coupling element 1109.5 is madeof aluminum, i.e. with α₁=10·10⁻⁶, α₂=1·10⁻⁶ and α₃=24·10⁻⁶, solutionsof Equation (5) with practical dimensions are between about x≈y≈0.44 andx=0.56, y=0.44.

The coupling between the first coupling element 1109.4 and the secondcoupling element 1109.5 as well as between the second coupling element1109.5 and the first lens unit 7 may be of any suitable type. Preferablya coupling is selected that provides a radial thermal deformationdecoupling. Furthermore, any suitable number of coupling units 1109.3may be chosen. Preferably, three coupling units 1109.3 are evenlydistributed at the circumference of the first lens unit 7.

The light and gas tight enclosure of the light path is provided by abellows 1109.6 or any other suitably flexible but gas and light tightcomponent.

The second coupling device 1109.2 is formed by a cylindrical firstcoupling element 1109.7 and a cylindrical second coupling element1109.8. Both, the first coupling element 1109.7 and a second couplingelement 1109.8 are arranged coaxially with the second lens unit 8.

The first coupling element 1109.7, on its first end, is coupled to thesecond interface surface 3.5 of the second interface 3.4 and has asecond coefficient of thermal expansion α₂ different from the firstcoefficient of thermal expansion α₁ of the second lens unit 8. Thesecond coupling element 1109.8 is coupled with its first end to thesecond end of the first coupling element 1109.7. The second couplingelement 1109.8, on its second end, is coupled to the second lens unit 8.The second coupling element 1109.8 has a third coefficient of thermalexpansion α₃ different from the first coefficient of thermal expansionα₁ of the second lens unit 8 and the second coefficient of thermalexpansion α₂ of the first coupling element 1109.7. Thus axial shiftcompensation may be achieved by suitably selecting the coefficients ofthermal expansion and the dimensions of the first and second couplingelement 1109.7 and 1109.8 in the same way as it has been described inthe context of the first coupling device 1109.1.

The light and gas tight enclosure of the light path is provided by thefirst and second coupling element 1109.7 and 1109.8 being suitablyconnected in a light and gas tight manner. Of course, any otheradditional suitably light and gas tight enclosure may be chosen as well.

It will be appreciated that any other couple of points of the opticalprojection system 2 may be selected as the reference point and the pointto kept at a constant distance form this reference point. Of course,compensation for the thermal expansion of the housing 3.1 may also berealized such that a constant distance is maintained between two pointson the first lens unit 7 and the second lens unit 8 at any temperaturesituation. Furthermore, it will be appreciated that only one type ofcoupling device may be used in one optical projection system.

In the foregoing, the present invention has been described in thecontext of embodiments having a housing made of a ceramic materialcomprising SiC or having a housing made of steel, respectively. However,it will be appreciated that other variants of the invention may comprisea housing made another material, in particular made of another ceramicmaterial, such as SiN or C/C—SiC, another metal or a metal alloy.

Finally, it is to be mentioned that the disclosure of all referencescited hereinbefore is incorporated herein by reference. Insofar as adescription of these references or a comment on these references isgiven, neither correctness nor completeness whatsoever is claimed.

What is claimed is:
 1. An optical projection system for amicrolithography system comprising a light path, a first lens unitreceiving a first part of said light path, a second lens unit receivinga second part of said light path, a support unit supporting said firstlens unit and said second lens unit; said first lens unit and saidsecond lens unit being elongated lens units comprising a plurality oflenses; said support unit comprising a housing receiving a third part ofsaid light path and enclosing at least one reflective element; saidhousing comprising at least a first interface and a second interface;said first interface being a first support interface supporting saidfirst lens unit; said second interface being a second support interfacesupporting said second lens unit at a location substantially opposite tosaid first interface.
 2. The optical projection system according toclaim 1, wherein: said first interface includes a first passage for saidlight path; said second interface includes a second passage for saidlight path; said housing defines an envelope for said light path; andsaid envelope, apart from said first passage and said second passage, isessentially gas tight.
 3. The optical projection system according toclaim 1, wherein said at least one reflective element is adjustably heldin said housing.
 4. The optical projection system according to claim 1,wherein said at least one reflective element is selected from the groupconsisting of a prism, a beam splitter, an optical element defining ashape of said light path within said housing, and an optical elementdefining a part of an optical axis of said optical projection system. 5.The optical projection system according to claim 1, wherein said firstlens unit has a first optical axis, and said second lens unit has asecond optical axis which is collinear with said first optical axis orparallel to said first optical axis.
 6. The optical projection systemaccording to claim 1, further comprising a third lens unit, wherein saidsupport unit is supporting said third lens unit.
 7. The opticalprojection system according to claim 6, wherein said first lens unit hasa first optical axis, and said third lens unit has a third optical axiswhich is inclined with respect to said first optical axis.
 8. Theoptical projection system according to claim 6, wherein said third lensunit comprises a reflective element.
 9. The optical projection systemaccording to claim 1, wherein said supporting part comprises a pluralityof support interfaces, and each support interface supports one of saidlens units.
 10. The optical projection system according to claim 1,wherein said supporting part is monolithic.
 11. The optical projectionsystem according to claim 1, wherein said supporting part is composed ofa plurality of separate components.
 12. The optical projection systemaccording to claim 1, wherein said supporting part comprises a materialhaving at least one property selected from the group consisting of ahigh modulus of elasticity, a high thermal conductivity, and a lowthermal expansion coefficient.
 13. The optical projection systemaccording to claim 1, wherein said supporting part comprises a ceramicmaterial.
 14. The optical projection system according to claim 1,wherein said supporting part comprises SiC.
 15. The optical projectionsystem according to claim 1, wherein said supporting part comprisesceramically bonded sub-sections.
 16. The optical projection systemaccording to claim 1, wherein said supporting part is formed using atleast one process selected from the group consisting of a low shrinkagenear-net-shape casting process and a low shrinkage near-net-shapereaction infiltration process.
 17. The optical projection systemaccording to claim 1, wherein said first interface comprises an airbearing unit.
 18. The optical projection system according to claim 1,further comprising a device configured to compensate a thermally inducedshift between components of said optical projection system.
 19. Theoptical projection system according to claim 1, wherein said firstinterface is configured to adjust said first optical element unit. 20.The optical projection system according to claim 1, wherein said secondinterface is configured to adjust said second optical element unit. 21.The optical projection system according to claim 1, wherein said supportunit has at least an internal interface configured to support and adjustsaid at least one reflective element received within said supporthousing.
 22. The optical projection system according to claim 2, whereinsaid envelope comprises a bellows.
 23. An apparatus, comprising: anillumination system; and an optical projection system according to claim1, wherein the apparatus is an optical exposure apparatus.
 24. A methodof operating an optical exposure apparatus comprising an illuminationsystem and an optical projection system, the method comprising: usingthe illumination system to illuminate a pattern of a mask; and using theoptical exposure apparatus to transfer an image of the illuminatedpattern of the mask onto a substrate, wherein the optical projectionsystem is an optical projection system according to claim 1.